A concept for silicon carbide power devices

ABSTRACT

A modular concept for Silicon Carbide power devices is disclosed where a low voltage module (LVM) is designed separately from a high voltage module (HVM). The LVM having a repeating structure in at least a first direction, the repeating structure repeats with a regular distance in at least the first direction, the HVM comprising a buried grid with a repeating structure in at least a second direction, the repeating structure repeats with a regular distance in at least the second direction, along any possible defined direction. Advantages include faster easier design and manufacture at a lower cost.

TECHNICAL FIELD

The present invention relates to a cost efficient modular method of designing and manufacturing an improved power device in SiC as well as the improved device itself.

BACKGROUND

In the state of the art, the fabrication of power semiconductors is usually divided up in epitaxial growth of the drift layer defining the blocking voltage and the processing of low voltage parts and edge termination. Since specification of drift layer doping varies with voltage class this will influence the design of the low voltage part of the device.

It is known that a Buried Grid (BG) can be used to design a power device in two separate devices connected in series to divide the high voltage part for efficient blocking, and the low voltage part for efficient control of conduction (see for instance the BG MOSFET disclosed in WO99/26296 and U.S. Pat. No. 6,091,108). But it has not been presented how to design the high voltage part so that it can be used for different types of low voltage devices (DMOS, Trench MOS, BJT, Schottky . . . ), and that the same low voltage device can be used for different voltage classes.

According to the state of the art, each specific area of a power device must be optimized for a specific voltage class, thus each voltage class and device type must be designed and fabricated in a dedicated process.

The integration techniques for a monolithically integrated solution on SiC are limited.

US 2014/0367771 discloses high voltage semiconductor devices and methods of making the devices.

U.S. Pat. No. 6,104,043 discloses a Schottky diode of SiC and a method for production thereof.

US2007/0228505 discloses a junction barrier Schottky rectifier having epitaxially grown P⁺-N Junctions and methods of making it.

US2013/0270577 discloses a grid-UMOSFET with electric field shielding of the gate oxide.

US2014/0264564 discloses a field effect transistor device with buried well protection regions.

WO2015/104084 discloses a trench MOSFET Transistor Device and a corresponding production method.

US2016/0126347 discloses a silicon carbide semiconductor device.

EP2058854 discloses a semiconductor device.

U.S. Pat. No. 6,091,108 discloses a semiconductor device in SiC comprising two parts (1, 2) connected in series. The first sub-device (1) being able to withstand only low voltages in the blocking state thereof and a voltage-limiting part (2) being able to withstand high voltages in the blocking state.

M. Bakowski in Journal of telecommunications and information technology 4/2009 25-36 entitled Prospects and development of vertical normally-off JFETs in SiC reviews the prospects of normally-off (N-off) JFET switches in SiC. The potential of selected vertical JFET concepts and all-JFET cascade solutions for N-off operation is analyzed using simulations.

Even though the methods of the prior art are used today there is still room for an improvement for instance with regard to the following problems: To shorten the development time of SiC power devices. Find a solution for efficient fabrication of different SiC power devices. Find a solution to facilitate the monolithic integration of different functions on SiC.

SUMMARY

It is an object of the present invention to obviate at least some of the disadvantages in the prior art and provide an improved power device in SiC.

After extensive research it has been found that advantages can be obtained by designing a high voltage module (HVM) and a low voltage module (LVM) separately.

In a first aspect there is provided a power device comprising a low voltage module (LVM) and a high voltage module (HVM),

the LVM having a repeating structure in at least a first direction, the repeating structure repeats with a regular distance in at least the first direction,

the HVM comprising a doped buried grid (4) with a repeating structure in at least a second direction, the repeating structure repeats with a regular distance in at least the second direction,

the HVM and the LVM comprising doped SiC,

the HVM comprising:

-   -   a) a substrate (1) having a first conductivity type,     -   b) an epitaxial drift layer (3) as a first drift layer with same         or opposite conductivity type as the substrate (1), the         epitaxial drift layer (3) is applied on the substrate (1),     -   c) at least one epitaxial layer (7) as a second drift layer, of         the same conductivity type as the epitaxial drift layer (3),     -   d) a buried grid (BG) (4) of opposite conductivity type than the         layers (3, 7),     -   e) a feeder (5) with same conductivity type as BG (4), connected         to BG (4),     -   f) an edge termination (6a, 6b), formed in the same layer as BG         (4) and feeder (5)         -   the BG (4), feeder (5), and edge termination (6 a, 6 b) are             applied in contact with the epitaxial drift layer (3) and             the layer above the epitaxial drift layer (3),         -   the at least one epitaxial layer (7) is applied on the             epitaxial drift layer (3), BG (4), feeder (5), and edge             termination (6 a, 6 b),

the HVM comprises SiC without any added metal or insulating layers, the HVM has a blocking voltage U_(B HVM)

the LVM comprising

-   -   a) a feeder contact (8),     -   b) at least one low voltage device (LVD) (9) having a blocking         voltage U_(B LVD) which is lower than U_(B HVM)

the feeder contact (8) of LVM being in contact with the feeder (5) of HVM,

the at least one epitaxial layer (7) is a common layer for the HVM and the LVD (9).

Further aspects and embodiments are defined in the appended claims, which are specifically incorporated herein by reference.

One advantage is that the design allows high current density since the unit cell of the LVM can be designed independent of the buried grid (BG) (4) and thus all surface area can be used efficiently.

The surge current capability of the power device is defined by the feeder design and thus separated from the LVM.

There is provided a shorter development time for a wide range of power products. Independent development of the HVM and LVM is an advantage. An optimized HVM for a specific voltage class can be used for all type of devices. An optimized LVM can be used for several different voltage classes

The cost of production and design is lower. Modular fabrication of HVM and LVM reduces the number of different fabrication processes needed for different device types and voltage classes, and manufacturing of each module can be more efficient when produced in larger volume.

Faster delivery is possible. Production time of a specific device type can be reduced if the HVM for the desired voltage class is produced in advance and kept in stock, so that different LVMs can be made on the stored HVMs. Further HVMs can be manufactured and sold separately for further processing and addition of LVMs by other parties.

There is more freedom in design of the LVM in terms of the device dimensions, the doping concentration and thickness of layers, geometries, the placement and alignment with the HVM etc. due to separate electric field shielding by the HVM.

There is avalanche capability provided since the voltage blocking is designed in to the HVM giving PN-diode like avalanche behavior and since the LVM is physically separated from the BG.

It is possible to provide lower on resistance with punch through design of drift layer since the BG (4) lowers the electric field at the surface.

Less margin in design of drift layer is needed since the highest electric field is located in the drift layer bulk and away from the electric field sensitive parts of the LVM. Variations in doping and thickness in the drift layer fabrication are hence less critical and do not influence the electric field at the LVM very much. This makes it possible to reduce the thickness and/or increase the doping of the drift layer, and thus lower its resistance.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention is described with reference to the following drawings in which:

FIG. 1 shows a modular design divided in High Voltage Module (HVM) and

Low Voltage Module (LVM) for efficient production of wide range of power device products. In this example there are 11 process modules (7 HVM+4 LVM) used for fabrication of 18 different device types.

FIG. 2 shows the electric field distribution in a device with HVM and LVM regions. The buried grid (BG) (4) shifts regions with high electric field in to the bulk of the drift layer and shields the LVM. Hence, the electric field is significantly lower on the LVM part.

FIGS. 3a and b show a cross section schematic of the “High Voltage Module” with edge termination a) up to 1.7 kV device and b) with edge termination for a generic design. 1 substrate, 2 epitaxial buffer layer, 3 epitaxial layer as a drift layer, 4 buried grid (BG), 5 feeder, 6 a and b edge termination, 7 a and 7 b two epitaxial regrown layers as example.

FIG. 4 shows a cross section schematic of the combination of the “High Voltage Module” and the “Low Voltage Module”. 1 substrate, 2 epitaxial buffer layer, 3 epitaxial layer as a drift layer, 4 buried grid (BG), 5 feeder, 7 a and 7 b two epitaxial regrown layers as example, 8 feeder contact, 9 Low Voltage Device.

FIG. 5 shows simulation results of the maximum effect of aligning the top layer (e.g. Schottky diode) with the grid and with the spacing for the (top) 1.2 kV and (bottom) 10 kV rectifiers. The solid and dashed curves show the low voltage device aligned with the grid and with the spacing, respectively.

FIG. 6 shows a punch through design (Right side) which can be used with efficient blocking for the HVM. Punch through design gives a reduced thickness and/or increased doping of the epitaxial drift layer (3) and thus gives lower resistance. This concept makes it easier to use a punch through design.

FIGS. 7a-c show cross section schematics of the modular concept with different designs. There are different versions of DMOSFETs as LVDs. 3 epitaxial layer as a drift layer, 4 buried grid (BG), 5 feeder, 7 denotes a set of epitaxial layers also referred to as 7 a and 7 b in case of two epitaxial layers, 8 feeder contact, 10 well region with same conductivity type as buried grid (4), 10 a implanted well region, 10 b epitaxial well region divided by JFET implant region (12), 11 a Source implant region, same conductivity type as drift layers (3) and (7), 12 JFET implant region, same conductivity type as drift layers (3) and (7). In FIG. 7b the JFET implant region (12) depth needs to be deeper than well layer (10 b) thickness. In FIG. 7c : the purpose of the JFET implant region (12) is to reduce JFET resistance, 13 Gate oxide, 14 Ohmic contact to source (11 a) and well (10 a or 10 b), 15 Gate, metal or poly-Si, 16 intermetal insulation, oxide, separates gate (15) from source metallization (17), 17 Source metallization, connecting MOSFET source (14) with feeder contact (8).

FIG. 8 shows a cross section schematic of the modular concept applied to a Trench MOSFET (or U-MOSFET). The Trench or UMOSFET as LVD. 3 epitaxial layer as a drift layer, 4 buried grid (BG), 5 feeder, 7 denotes a set of epitaxial layers also referred to as 7 a and 7 b in case of two epitaxial layers, 8 feeder contact, 10 b epitaxial well region with the same conductivity type as the buried grid (4) divided by a trench, 11 b epitaxial source region, same conductivity type as drift layers (3) and (7), 13 Gate oxide, 14 Ohmic contact to source (11 b) and well (10 b), 15 Gate, metal or poly-Si, 16 intermetal insulation, oxide, separates gate (15) from source metallization (17), 17 Source metallization, connecting MOSFET source (14) with feeder contact (8).

FIG. 9 shows a cross section schematic of the modular concept applied to a BJT. The BJT as LVD. 3 epitaxial layer as a drift layer, 4 buried grid (BG), 5 feeder, 7 denotes a set of epitaxial layers also referred to as 7a and 7b in case of two epitaxial layers, 8 feeder contact, 21 epitaxial base layer, same conductivity type as buried grid (4), 22 base contact implant, same conductivity type as base layer (21) and buried grid (4), 23 Emitter layer, same conductivity type as drift layers (3) and (7), 24 Ohmic contact to base contact implant (22), 25 Ohmic contact to emitter layer (23), 26 Surface passivation layer, oxide, 27 intermetal insulation, oxide, separates base contact (24) from emitter metallization (28), 28 Emitter metallization, connecting emitter contact (25) with feeder contact (8).

FIG. 10 shows a cross section schematic of the modular concept applied to a JBS rectifier. Schottky diode as LVD. 3 epitaxial layer as a drift layer, 4 buried grid (BG), 5 feeder, 7 denotes a set of epitaxial layers also referred to as 7 a and 7 b in case of two epitaxial layers, 19 Schottky contact, 20 Surface passivation layer, oxide, 21 Metallization, connecting Schottky contact (19) with feeder contact (8).

FIG. 11 shows parts of a device according to an embodiment of the invention, some parts are not shown for clarity. There is shown 1 substrate, 2 epitaxial buffer layer, 3 epitaxial layer as a drift layer, 30 backside metallization, and 18 an epitaxially grown region as well as a plane parallel with the substrate (1) and the projection of the epitaxially grown region (18) in the plane including the boundary line (I) of the projection in the plane. The surrounding of the boundary line (I) in the plane is indicated with solid lines, so that the distance from the boundary line (I) to any point in the surrounding is maximum 0.5 μm. Any corners of the surrounding area are rounded so that the surrounding around the line is determined by a circle with radius 0.5 μm which is moved along the boundary line (I).

DETAILED DESCRIPTION

Before the invention is disclosed and described in detail, it is to be understood that this invention is not limited to particular compounds, configurations, method steps, substrates, and materials disclosed herein as such compounds, configurations, method steps, substrates, and materials may vary somewhat. It is also to be understood that the terminology employed herein is used for the purpose of describing particular embodiments only and is not intended to be limiting since the scope of the present invention is limited only by the appended claims and equivalents thereof.

It must be noted that, as used in this specification and the appended claims, the singular forms “a”, “an” and “the” include plural referents unless the context clearly dictates otherwise.

If nothing else is defined, any terms and scientific terminology used herein are intended to have the meanings commonly understood by those of skill in the art to which this invention pertains.

“Blocking voltage” as used throughout the description and the claims denotes the maximum reverse dc voltage that will not cause breakdown of a semiconductor component such as diode or a more complex component.

“Buried grid” as used throughout the description and the claims denotes a grid structure of a material with one conductivity type in a material with the opposite conductivity type.

“Conductivity type” as used throughout the description and the claims denotes the type of conduction in a semiconductor material. N-type denotes electron conduction meaning that excess electrons move in the semiconductor giving a current flow and p-type denotes hole conduction, meaning that excess holes move in the semiconductor giving a current flow. A n-type semiconductor material is achieved by donor doping and a p-type semiconductor by acceptor dopants. In SiC, nitrogen is commonly used as donor dopant and aluminum as acceptor dopant. If a material is a doped semiconductor such as SiC, the material either has conductivity type p or conductivity type n.

“Current spreading layer” as used throughout the description and the claims denotes a layer which is applied to ensure that the injected current is spread as evenly as possible across the whole active area of the device.

“Doped” as used throughout the description and the claims denotes that an intrinsic semiconductor such as SiC has got added impurities to modulate its electrical properties and become an extrinsic semiconductor.

“Epitaxial” as used throughout the description and the claims denotes that the material has been manufactured with epitaxial growth, in this case epitaxial growth of SiC.

“High voltage module” and “low voltage module” as used throughout the description and the claims refer to the intended voltage in a relative sense compared to each other so that the intended voltage for the high voltage module is higher than the intended voltage for the low voltage module.

“Repeating structure” as used throughout the description and the claims denotes a structure that repeats in a regular manner with a certain distance, pitch.

“Substrate” as used throughout the description and the claims denotes a piece of material on which the power device is built up.

In a first aspect there is provided a power device comprising a low voltage module (LVM) and a high voltage module (HVM), the LVM having a repeating structure in at least a first direction, the repeating structure repeats with a regular distance in at least the first direction, the HVM comprising a doped buried grid (4) with a repeating structure in at least a second direction, the repeating structure repeats with a regular distance in at least the second direction, the HVM and the LVM comprising doped SiC, the HVM comprising:

-   -   a) a substrate (1) having a first conductivity type,     -   b) an epitaxial drift layer (3) as a first drift layer with same         or opposite conductivity type as the substrate (1), the         epitaxial drift layer (3) is applied on the substrate (1),     -   c) at least one epitaxial layer (7) as a second drift layer, of         the same conductivity type as the epitaxial drift layer (3),     -   d) a buried grid (BG) (4) of opposite conductivity type than the         layers (3, 7),     -   e) a feeder (5) with same conductivity type as BG (4), connected         to BG (4),     -   f) an edge termination (6a, 6b), formed in the same layer as BG         (4) and feeder (5).

the BG (4), feeder (5), and edge termination (6 a, 6 b) are applied in contact with the epitaxial drift layer (3) and the layer above the epitaxial drift layer (3),

-   -   the at least one epitaxial layer (7) is applied on the epitaxial         drift layer (3), BG (4), feeder (5), and edge termination (6 a,         6 b),

the HVM comprises SiC without any added metal or insulating layers, the HVM has a blocking voltage U_(B HVM)

the LVM comprising

-   -   a) a feeder contact (8),     -   b) at least one low voltage device (LVD) (9) having a blocking         voltage U_(B LVD) which is lower than U_(B HVM),

the feeder contact (8) of LVM being in contact with the feeder (5) of HVM,

the at least one epitaxial layer (7) is a common layer for the HVM and the LVD (9).

The first direction is any direction selected so that there is a repeating structure that repeats itself regularly when moving along the selected direction. To determine if there is a repeating structure in a direction a line in that direction is drawn and any structures crossing the line are investigated to see if the structures repeat. The distance from one repeating feature to the next corresponding repeating feature is called the pitch. The same applies to the second direction. The first and second directions may be the same or different. Examples of repeating structures include but are not limited to regularly spaced hexagons, circles, squares, rectangles, triangles, lines and so on of a differently doped SiC. Typically, the repeating structures are made of doped SiC where the doping alternatingly has opposite conductivity types, i.e. n and p.

The first epitaxial drift layer (3) can be either an n-type epitaxial layer or a p-type epitaxial layer. In one embodiment the first epitaxial drift layer (3) is an n-type epitaxial layer. In an alternative embodiment the first epitaxial drift layer (3) is a p-type epitaxial layer. Epitaxial means that the layer is made by epitaxial growth of SiC.

The HVM should not comprise any metal or insulating layers, i.e. layers of elemental metal, silicon dioxide, or silicon nitride. The subsequent addition of the LVM is then simplified. Added metal would disturb or make subsequent addition of the LVM impossible. The addition of the LVM requires process steps which can only be performed without layers of elemental metal.

The HVM and LVM can be produced separately in a modular way and thus enable production of a wide range of different products with a few standardized fabrication processes.

The buried grid (BG) (4) can also be called junction barrier grid. The cell structure of the BG (4) of the HVM (see FIG. 2) is independent of the unit cell structure of the LVM. By this the device area can be used efficiently and optimized separately for each type of device and voltage class.

The structure consisting of the drift layer (3), BG (4), and termination (6 a, 6 b) blocks the voltage and shields the LVM from high electric field so that the electric field at the LVM and thereby also at the LVD is lower.

The feeder (5) is a potential reference in the final device, i.e. a packaged component made of the power device.

The edge termination (6 a, 6 b) consists either of termination zones (6 a) or termination rings (6 b) or a combination of both. If seen from above the termination is in one embodiment a zone around the active area, i.e. a JTE zone with modulated doping and blocking voltage dependent width. In one embodiment there are two JTE zones with modulated doping around the active area. In an alternative embodiment the edge termination is a region around the active device area comprising floating guard rings. In one embodiment the edge termination is a combination of JTE zone termination and floating guard ring termination. In such a combination embodiment the zone(s) can also comprise rings. The termination area spread the electric field laterally to target the optimal breakdown voltage. For blocking voltage up to 2 kV, the edge termination can be floating guard rings with the same doping profile as feeders (5) and grid (4) (FIG. 3a ).

The LVM design is independent of the HVM design. So, the design of the LVM for a specific device is the same for all voltage classes.

Due to the shielding of the electric field by the HVM, the design of the LVM and thereby the LVDs can be optimized with less constraints. This allows e.g. lower p-well doping concentration for a MOSFET resulting in higher mobility of the channel.

The HVM is designed for a specific voltage class and is optimized to fit different types of LVDs (9). The BG (4) design is the part of the HVM that should be adapted to protect the LVM and thereby the LVD (9) against high electric field. The BG (4) properties including the doping concentration and profile, thickness, width, and spacing should be optimized for a reasonable trade-off between conducting and blocking modes.

In one embodiment the HVM comprises an epitaxial buffer layer (2) between the substrate (1) and the epitaxial drift layer (3). The epitaxial buffer layer (2) is of the same conductivity type as the epitaxial drift layer (3).

In one embodiment the at least one epitaxial layer (7) comprises at least two epitaxial layers (7 a and 7 b) of the same conductivity type as the epitaxial drift layer (3), each layer (7 a and 7 b) having different doping levels and thicknesses and can be either a current spreading layer or a second drift layer. A current spreading layer improves the lateral distribution of the current and can thus improve the performance of the device. In one embodiment the epitaxial regrown layer (7 a) closest to the buried grid layer (4) has a higher doping concentration compared to the epitaxial regrown layer (7 b) furthest away from the buried grid layer (4).

In one embodiment the epitaxial regrown layer (7) has a gradient in the doping concentration. In one embodiment the gradient has the highest doping concentration closest to the buried grid layer (4). In another embodiment the gradient has the lowest doping concentration closest to the buried grid layer (4). In one embodiment there is a gradient from low to high to low going away from the buried grid layer (4). In one such embodiment the doping concentration in the epitaxial regrown layer (7) is lower closest to the buried grid layer (4) and furthest away from the buried grid layer (4) compared to the middle part of the epitaxial regrown layer (7).

In one embodiment there is a common electrode between the feeder contact (8) and a source ohmic contact (14). In one embodiment there is a common electrode between the feeder contact (8) and an emitter ohmic contact (25). In one embodiment there is a common electrode between the feeder contact (8) and a contact (19). This common electrode couples in parallel the LVD and the feeder PN-diodes, which protect the LVD from over currents like surge currents or short circuit currents. This design can be utilized for instance for JBS diodes or power MOSFETs.

The fact that the buried grid (BG) (4) is physically separated from the LVM insures good avalanche capability of the device in blocking.

In one embodiment the LVM comprises at least two low voltage devices (LVDs).

In one embodiment the power device comprises a MOSFET switch and Schottky diode in parallel as LVDs.

In one embodiment the epitaxial drift layer (3) has a thickness in the range of 3 to 300 μm. In one embodiment the epitaxial drift layer (3) has a thickness in the range of 7 to 100 μm. In one embodiment the epitaxial drift layer (3) has a thickness in the range of 10 to 100 μm. The thickness of the epitaxial drift layer (3) depends on voltage class and for instance 10 μm and 100 μm drift layers are suitable for 1200V and 15 kV devices, respectively. The doping level in the epitaxial drift layer (3) should be adapted to the thickness and voltage class. For thin layers towards the lower end of the interval 3-300 μm a doping concentration around the order of magnitude 1e16 cm⁻³ is suitable as a starting point. For thicker layers towards the upper end of the interval 3-300 μm a doping concentration around the order of magnitude 1e14 cm⁻³ is suitable.

In one embodiment the buried grid (4) has a doping concentration in the range of 3e17 cm⁻³ to 3e20 cm⁻³, a space between adjacent members of the buried grid (4) in the range of 1 to 5 μm, a thickness of the buried grid (4) in the range of 0.5 to 2 μm, and a width of the members of the buried grid (4) of more than 0.5 μm. In one embodiment the members of the buried grid (4) have a width in the interval 0.5 to 2 μm.

In one embodiment the at least one epitaxial layer (7) have a thickness of more than 0.3 μm, and a doping concentration in the range of 1e14 cm⁻³ to 1e17 cm⁻³. To have an optimum shielding effect, the thickness and doping concentration of the regrown layer closest to the buried grid (4) depends on the voltage class.

In one embodiment the at least one epitaxial layer (7) has a thickness in the range of 1 to 1.5 μm.

The feeder (5) defines the surge current capability of the device. A minimum width of 10 μm is typically needed for <2 kV compared to 50 μm for 10 kV devices. In one embodiment the feeder (5) has a width of at least 10 μm. In one embodiment the feeder (5) has a width of at least 50 μm.

The design of the HVM and LVM are independent. In one embodiment along any possible defined direction, the pitch, i.e. the distance between repeating structures of the LVM is not the same as the pitch of the HVM, the distances measured along the same direction. For a typical design for instance the buried grid (4) can repeat thousands of times along a direction. In the drawings the repetitions are shown only a few times or as one repeating structure for clarity. Similarly the LVM may comprise repeating structures which also may repeat many times in typical component. The shape or geometry of the buried grid (4) design can be different than the unit cell of the LVD (9) (e.g. stripes geometry for grid and Hexagon for LVD). Thanks to the shielding of the LVM parts by the HVM parts, the alignment of the grid of HVM and unit cell of LVD has no dramatic effect on the performance of the device, particularly for high-voltage devices (FIG. 5). Note that the feeder contact (8) is in contact with the feeder (5) of HVM, and is in general not a part of the repeating structure of the buried grid (4) but it typically has a repeating structure with much larger pitch than the buried grid (4). In the drawings 7-9 the connection between the feeder contact (8) and the feeder (5) is shown to the right, to the left a unit cell of the LVD repeating structures is shown. The structures to the left in FIGS. 7-9 are thus repeated many times in a typical component.

The high electric field is sustained by the epitaxial drift layer (3) and by the buried grid (4), and thus the epitaxial drift layer (3) is not limited by design rules of LVD. Therefore, it is possible to decrease the thickness and increase the doping concentration of the epitaxial drift layer (3) according to such of the punch through design for a PiN rectifier. This results in higher conductivity and lower on-resistance of the device with no influence on the voltage blocking performance. See FIG. 6.

In one embodiment at least one of the buried grid (4) and feeder (5) is formed by epitaxially filled trenches.

In one embodiment the at least one LVD comprises areas shaped as hexagons.

In one embodiment the substrate (1) and the epitaxial drift layer (3) are n-type. Today the most common commercially available substrates are n-type, but the invention can with equally good result be used if the substrate (1) and the epitaxial drift layer (3) are p-type. In one embodiment either the combination of an n-type substrate (1) and a p-type epitaxial drift layer (3) or the combination of a p-type substrate (1) and an n-type epitaxial drift layer (3) are used. Devices fabricated with such a combination are e.g. IGBTs.

In one embodiment the buried grid (4) comprises a plurality of grids, wherein at least a part of the grids has a ledge positioned centered under the grid, said ledge positioned towards the substrate (1), said ledge having a smaller lateral dimension than the grid. In this embodiment there is an increase in the electric field shielding efficiency of the grid which is reducing the electric field on the surface of the device. This increase the blocking voltage and lower the leakage current without adding forward resistance. Alternatively a wider grid spacing can be used with this design, leading to lower on-resistance. The structure is more tolerant to process variations such as misalignment, dose and energy variation in ion implantation, etching depth etc.

In one embodiment the buried grid (4) comprises a plurality of grids and wherein each grid comprises an upper part and a lower part said lower part is towards the substrate (1) and wherein the upper part is manufactured using epitaxial growth and wherein the lower part is manufactured using ion implantation. In this embodiment it is possible to manufacture a grid with rounded corners as well as an upper part with a high doping level. It is possible to manufacture a component with efficient voltage blocking, high current conduction, low total resistance, high surge current capability, and fast switching.

In one embodiment the epitaxial drift layer (3) comprises a current spreading layer (CSL) located between the buried grid (4) and the epitaxial buffer layer (2). The CSL has the effect of spreading out the current more efficient under the buried grid (4). In one embodiment the CSL is directly under the buried grid (4) and in contact with the buried grid (4). In one embodiment the CSL is close to the buried grid (4).

In one embodiment there is at least one epitaxially grown region (18) of the same conductivity type as the feeder (5) and the buried grid (4) in contact with the ohmic contact (8), wherein the feeder (5) comprises at least one region for each epitaxially grown region (18), wherein a projection of the epitaxially grown region (18) in a plane parallel with the substrate (1) has a boundary line (I) limiting the projection of the epitaxially grown region (18), wherein the feeder layer (5) is applied at least so that a projection of the feeder (5) in a plane parallel to the substrate (1) is in a surrounding of the boundary line (I), so that the distance from the boundary line (I) to any point in the surrounding is maximum 0.5 μm and wherein the feeder (5) also is applied so that the distance from the lower part of the epitaxially grown region (18) to the upper part of the feeder (5) is in the range 0-5 μm, the direction up is given by the direction perpendicular away from the n-type substrate (1). The feeders close to the corners of the feeder contact (8) have the effect of reducing the negative effects of the sharp corners of the epitaxially grown region (18) regarding the electrical field.

The surrounding of the boundary line (I) can be determined so that a circle with radius 0.5 μm is moved along the boundary line (I) and the area swept over by the circle is within the surrounding so that the distance from the boundary line (I) to any point in the surrounding is maximum 0.5 μm. This is applicable to any shape of the boundary line (I). If the epitaxially grown region (18) has the form of a very long trench there may be two boundary lines. If viewed from above, i.e. from a position looking at the largest area of the n-type substrate (1), then the p-type feeder (5) is applied close to the boundary of the epitaxially grown region (18), more in particular within ±0.5 μm from the boundary line. This defines a surrounding of ±0.5 μm from the boundary line and the p-type feeder (5) is applied at least in this surrounding, it can also be applied outside this surrounding. The p-type feeder (5) should also be applied fairly close to the epitaxially grown region (18), seen from the side, i.e. looking at a cross cut of the device. Then the p-type feeder (5) is either in contact with the epitaxially grown region (18), or maximum 5 μm below the epitaxially grown region (18). Since the projection of the epitaxially grown region (18) is used to determine the boundary line (I), the largest part of the epitaxially grown region (18) determines the position of the p-type layer (5). Since the cross section of the p-type feeder (5) is fairly close to rectangular, the condition will imply that the p-type feeder (5) is applied at least close to the corners where they will mitigate the effects of the sharp corners on the electrical field.

In a second aspect there is provided a method of manufacturing a power device in SiC comprising a low voltage module (LVM) and a high voltage module (HVM), the low voltage module (LVM) having a repeating structure in at least a first direction, the repeating structure repeats with a regular distance in at least the first direction, the high voltage module (HVM) comprising a doped buried grid (4) with a repeating structure in at least a second direction, the repeating structure repeats with a regular distance in at least the second direction, the HVM and the LVM comprising doped SiC.

In one embodiment the HVM is manufactured first and then a LVM is manufactured on the HVM. This enables manufacture of a number of standardized HVMs which may be stored for future use of sold. When a specific component is to be manufactured a LVM is added on top of a standardized HVM.

In one embodiment the LVM and the HVM are manufactured separately and then assembled.

In one embodiment the manufacture of the LVD comprises at least one selected from the group consisting of patterning of the at least one epitaxial layer (7) and addition of further epitaxial layers.

In one embodiment the manufacture of the LVD comprises at least one method selected from the group consisting of selective doping, contact, oxide, etching, and epitaxial growth.

To make processing of subsequent steps more uniform, it is advantageous if wafer thickness is kept within certain limits, e.g. for same cooling, gas flows or optical alignment. To enable this the substrate could be thinned after the epitaxy growth or substrates with different thickness could be used.

In one embodiment the blocking voltage of the LVD, U_(B LVD) is lower than 10% of the blocking voltage of the HVM, U_(B HVM). In one embodiment the blocking voltage of the LVD, U_(B LVD) is 100 V or lower. 

1. A power device comprising a low voltage module (LVM) and a high voltage module (HVM), the LVM having a repeating structure in at least a first direction, the repeating structure repeats with a regular distance in at least the first direction, the HVM comprising a doped buried grid with a repeating structure in at least a second direction, the repeating structure repeats with a regular distance in at least the second direction, the HVM and the LVM comprising doped SiC, the HVM comprising: a) a substrate having a first conductivity type, b) an epitaxial drift layer as a first drift layer with same or opposite conductivity type as the substrate, the epitaxial drift layer is applied on the substrate, c) at least one epitaxial layer as a second drift layer, of the same conductivity type as the epitaxial drift layer, d) a buried grid (BG) of opposite conductivity type than the layers, e) a feeder with same conductivity type as BG, connected to BG, f) an edge termination, formed in the same layer as BG and feeder, the BG, feeder, and edge termination are applied in contact with the epitaxial drift layer and the layer above the epitaxial drift layer, the at least one epitaxial layer is applied on the epitaxial drift layer, BG, feeder, and edge termination, the HVM comprises SiC without any added metal or insulating layers, the HVM has a blocking voltage U_(B HVM) the LVM comprising a) a feeder contact, b) at least one low voltage device (LVD) having a blocking voltage U_(B LVD) which is lower than U_(B HVM), the feeder contact of LVM being in contact with the feeder of HVM, the at least one epitaxial layer is a common layer for the HVM and the at least one LVD.
 2. The power device according to claim 1, wherein along any possible defined direction, the distance between repeating structures of the LVM is not the same as the distance between the repeating structures of the HVM, the distances measured along the same direction.
 3. The power device according to claim 1, wherein the HVM comprises an epitaxial buffer layer with same conductivity type as the epitaxial drift layer between the substrate and the epitaxial drift layer.
 4. The power device according to claim 1, wherein there is a common electrode between the feeder contact and a source ohmic contact.
 5. The power device according to claim 1, wherein there is a common electrode between the feeder contact and an emitter ohmic contact.
 6. The power device according to claim 1, wherein there is a common electrode between the feeder contact and a contact.
 7. The power device according to claim 1, wherein the LVM comprises at least two low voltage devices (LVDs).
 8. The power device according to claim 7 comprising a MOSFET switch and a Schottky diode in parallel as LVDs.
 9. The power device according to claim 1, wherein the epitaxial drift layer has a thickness in the range of 3 to 300 μm.
 10. The power device according to claim 1, wherein the epitaxial drift layer has a thickness in the range of 7 to 100 μm.
 11. The power device according to claim 1, wherein the epitaxial drift layer has a thickness in the range of 10 to 100 μm.
 12. The power device according to claim 1, wherein the buried grid has a doping concentration in the range of 3e17 cm⁻³ to 3e20 cm⁻³, a space between adjacent members of the buried grid in the range of 1 to 5 μm, a thickness of the buried grid in the range of 0.5 to 2 μm, and a width of the members of the buried grid of more than 0.5 μm.
 13. The power device according to claim 1, wherein the buried grid has a width of the members of the buried grid in the interval 0.5 to 2 5μm.
 14. The power device according to claim 1, wherein the at least one epitaxial layer has a thickness of more than 0.3 μm, and a doping concentration in the range of 1 e14 cm⁻³ to 1 e17 cm⁻³.
 15. The power device according to claim 1, wherein the at least one epitaxial layer has a thickness in the range of 1 to 1.5 μm.
 16. The power device according to claim 1, wherein the feeder has a width of at least 10 μm.
 17. The power device according to claim 1, wherein the feeder has a width of at least 50 μm.
 18. The power device according to claim 1, wherein at least one of the buried grid and feeder is formed by epitaxially filled trenches.
 19. The power device according to claim 1, wherein the at least one LVD comprises areas shaped as hexagons.
 20. The power device according to claim 1, wherein the buried grid comprises a plurality of grids, wherein at least a part of the grids has a ledge positioned centered under the grid, said ledge positioned towards the substrate, said ledge having a smaller lateral dimension than the grid.
 21. The power device according to claim 1, wherein the buried grid comprises a plurality of grids and wherein each grid comprises an upper part and a lower part said lower part is towards the substrate and wherein the upper part is manufactured using epitaxial growth and wherein the lower part is manufactured using ion implantation.
 22. The power device according to claim 3, wherein the epitaxial drift layer comprises a current spreading layer located between the buried grid and the epitaxial buffer layer.
 23. The power device according to claim 1, wherein there is at least one epitaxially grown region of same conductivity type as the feeder and the buried grid and in contact with the ohmic contact, wherein the feeder comprises at least one region for each epitaxially grown region, wherein a projection of the epitaxially grown region in a plane parallel with the substrate has a boundary line limiting the projection of the epitaxially grown region, wherein the feeder layer is applied at least so that a projection of the feeder in a plane parallel to the substrate is in a surrounding of the boundary line, so that the distance from the boundary line to any point in the surrounding is maximum 0.5 μm and wherein the feeder also is applied so that the distance from the lower part of the epitaxially grown region to the upper part of the feeder is in the range 0-5 μm, the direction up is given by the direction perpendicular away from the n-type substrate.
 24. The power device according to claim 1, wherein the at least one epitaxial layer comprises at least two epitaxial layers of the same conductivity type as the epitaxial drift layer, each layer having different doping levels and thicknesses, and could act either as a current spreading layer or a second drift layer.
 25. A method of manufacturing a power device in SiC comprising a low voltage module (LVM) and a high voltage module (HVM), the low voltage module (LVM) having a repeating structure in at least a first direction, the repeating structure repeats with a regular distance in at least the first direction, the high voltage module (HVM) comprising a doped buried grid with a repeating structure in at least a second direction, the repeating structure repeats with a regular distance in at least the second direction, the HVM and the LVM comprising doped SiC.
 26. The method according to claim 25, wherein the HVM is manufactured first and then a LVM is manufactured on the HVM.
 27. The method according to claim 26, wherein the HVM is stored before manufacture of the LVM.
 28. The method according to claim 25, wherein the LVM and the HVM are manufactured separately and then assembled.
 29. The method according to claim 25, wherein the manufacture of the LVD comprises at least one selected from the group consisting of patterning of the at least one epitaxial layer and addition of further epitaxial layers.
 30. The method according to claim 25, wherein the manufacture of the LVD comprises at least one method selected from the group consisting of selective doping, contact, oxide, etching, and epitaxial growth. 